JPS5855732A - 静電容量型圧力センサ - Google Patents
静電容量型圧力センサInfo
- Publication number
- JPS5855732A JPS5855732A JP56153611A JP15361181A JPS5855732A JP S5855732 A JPS5855732 A JP S5855732A JP 56153611 A JP56153611 A JP 56153611A JP 15361181 A JP15361181 A JP 15361181A JP S5855732 A JPS5855732 A JP S5855732A
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- amplifier
- film
- pressure sensor
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N39/00—Integrated devices, or assemblies of multiple devices, comprising at least one piezoelectric, electrostrictive or magnetostrictive element covered by groups H10N30/00 – H10N35/00
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0072—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance
- G01L9/0073—Transmitting or indicating the displacement of flexible diaphragms using variations in capacitance using a semiconductive diaphragm
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G5/00—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture
- H01G5/16—Capacitors in which the capacitance is varied by mechanical means, e.g. by turning a shaft; Processes of their manufacture using variation of distance between electrodes
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measuring Fluid Pressure (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56153611A JPS5855732A (ja) | 1981-09-30 | 1981-09-30 | 静電容量型圧力センサ |
US06/426,084 US4495820A (en) | 1981-09-30 | 1982-09-28 | Capacitive pressure sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56153611A JPS5855732A (ja) | 1981-09-30 | 1981-09-30 | 静電容量型圧力センサ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5855732A true JPS5855732A (ja) | 1983-04-02 |
JPS6356935B2 JPS6356935B2 (en]) | 1988-11-09 |
Family
ID=15566265
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56153611A Granted JPS5855732A (ja) | 1981-09-30 | 1981-09-30 | 静電容量型圧力センサ |
Country Status (2)
Country | Link |
---|---|
US (1) | US4495820A (en]) |
JP (1) | JPS5855732A (en]) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62186938A (ja) * | 1986-02-13 | 1987-08-15 | Okazaki Seisakusho:Kk | 固体の接合方法 |
US5041900A (en) * | 1987-08-06 | 1991-08-20 | Hamilton Standard Controls, Inc. | Semiconductor device having sealed electrical feedthrough |
JP2000018908A (ja) * | 1998-07-02 | 2000-01-21 | Nippon Telegr & Teleph Corp <Ntt> | 表面形状認識用センサ |
US6438257B1 (en) | 1998-07-02 | 2002-08-20 | Nippon Telegraph And Telephone Corporation | Small capacitance change detection device |
CN111128551A (zh) * | 2019-12-03 | 2020-05-08 | 上海理工大学 | 一种基于二氧化硅微球的微电发生器及制备方法 |
Families Citing this family (54)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3310643C2 (de) * | 1983-03-24 | 1986-04-10 | Karlheinz Dr. 7801 Schallstadt Ziegler | Drucksensor |
US4530029A (en) * | 1984-03-12 | 1985-07-16 | United Technologies Corporation | Capacitive pressure sensor with low parasitic capacitance |
US4609968A (en) * | 1984-05-18 | 1986-09-02 | Becton, Dickinson And Company | Glass inlays for use in bonding semiconductor wafers |
FI75426C (fi) * | 1984-10-11 | 1988-06-09 | Vaisala Oy | Absoluttryckgivare. |
US4625561A (en) * | 1984-12-06 | 1986-12-02 | Ford Motor Company | Silicon capacitive pressure sensor and method of making |
DE3668499D1 (de) * | 1985-03-27 | 1990-03-01 | Siemens Ag | Kapazitiver drucksensor. |
US4586109A (en) * | 1985-04-01 | 1986-04-29 | Bourns Instruments, Inc. | Batch-process silicon capacitive pressure sensor |
US4625560A (en) * | 1985-05-13 | 1986-12-02 | The Scott & Fetzer Company | Capacitive digital integrated circuit pressure transducer |
DE3635462A1 (de) * | 1985-10-21 | 1987-04-23 | Sharp Kk | Feldeffekt-drucksensor |
NL8503574A (nl) * | 1985-12-24 | 1987-07-16 | Sentron V O F | Druksensor. |
JPS63149531A (ja) * | 1986-12-12 | 1988-06-22 | Fuji Electric Co Ltd | 静電容量式圧力センサ |
US4772983A (en) * | 1987-04-20 | 1988-09-20 | Linear Measurements, Inc. | Method and article for a nearly zero temperature coefficient pressure transducer |
FI78784C (fi) * | 1988-01-18 | 1989-09-11 | Vaisala Oy | Tryckgivarkonstruktion och foerfarande foer framstaellning daerav. |
US4808549A (en) * | 1988-05-27 | 1989-02-28 | Ford Motor Company | Method for fabricating a silicon force transducer |
US4996627A (en) * | 1989-01-30 | 1991-02-26 | Dresser Industries, Inc. | High sensitivity miniature pressure transducer |
DE4006108A1 (de) * | 1990-02-27 | 1991-08-29 | Bosch Gmbh Robert | Verfahren zum aufbau von mikromechanischen bauelementen in dickschichttechnik |
JPH04268725A (ja) * | 1991-02-25 | 1992-09-24 | Canon Inc | 力学量検出センサおよびその製造方法 |
US5155061A (en) * | 1991-06-03 | 1992-10-13 | Allied-Signal Inc. | Method for fabricating a silicon pressure sensor incorporating silicon-on-insulator structures |
DE4206675C2 (de) * | 1992-02-28 | 1995-04-27 | Siemens Ag | Verfahren zum Herstellen von Druckdifferenz-Sensoren |
US5369544A (en) * | 1993-04-05 | 1994-11-29 | Ford Motor Company | Silicon-on-insulator capacitive surface micromachined absolute pressure sensor |
US5375034A (en) * | 1993-12-02 | 1994-12-20 | United Technologies Corporation | Silicon capacitive pressure sensor having a glass dielectric deposited using ion milling |
US5744725A (en) * | 1994-04-18 | 1998-04-28 | Motorola Inc. | Capacitive pressure sensor and method of fabricating same |
JP3383081B2 (ja) | 1994-07-12 | 2003-03-04 | 三菱電機株式会社 | 陽極接合法を用いて製造した電子部品及び電子部品の製造方法 |
US5646348A (en) * | 1994-08-29 | 1997-07-08 | The Charles Stark Draper Laboratory, Inc. | Micromechanical sensor with a guard band electrode and fabrication technique therefor |
US5578843A (en) * | 1994-10-06 | 1996-11-26 | Kavlico Corporation | Semiconductor sensor with a fusion bonded flexible structure |
US5637802A (en) * | 1995-02-28 | 1997-06-10 | Rosemount Inc. | Capacitive pressure sensor for a pressure transmitted where electric field emanates substantially from back sides of plates |
US6484585B1 (en) | 1995-02-28 | 2002-11-26 | Rosemount Inc. | Pressure sensor for a pressure transmitter |
DE19616014B4 (de) * | 1996-04-23 | 2006-04-20 | Robert Bosch Gmbh | Verfahren zur Herstellung von mikromechanische Strukturen aufweisenden Halbleiterbauelementen |
DE19616970B4 (de) * | 1996-04-27 | 2012-04-12 | Robert Bosch Gmbh | Verfahren zur Herstellung von mikromechanische Strukturen aufweisenden Halbleiterbauelementen |
US5966617A (en) * | 1996-09-20 | 1999-10-12 | Kavlico Corporation | Multiple local oxidation for surface micromachining |
DE69702745T2 (de) * | 1997-03-04 | 2000-12-07 | Stmicroelectronics S.R.L., Agrate Brianza | Methode zur Herstellung von mikromechanischen Drucksensoren |
US5965821A (en) * | 1997-07-03 | 1999-10-12 | Mks Instruments, Inc. | Pressure sensor |
US6034414A (en) * | 1997-11-18 | 2000-03-07 | Industrial Technology Research Institute | Variable capacitor using resistor generated heat to control dielectric thickness |
US20040099061A1 (en) | 1997-12-22 | 2004-05-27 | Mks Instruments | Pressure sensor for detecting small pressure differences and low pressures |
US5982608A (en) * | 1998-01-13 | 1999-11-09 | Stmicroelectronics, Inc. | Semiconductor variable capacitor |
EP0950884B1 (de) * | 1998-04-17 | 2004-08-18 | Micronas GmbH | Kapazitiver Sensor |
DE19847563A1 (de) * | 1998-04-17 | 1999-10-28 | Micronas Intermetall Gmbh | Kapazitiver Sensor |
US6561038B2 (en) | 2000-01-06 | 2003-05-13 | Rosemount Inc. | Sensor with fluid isolation barrier |
US6505516B1 (en) | 2000-01-06 | 2003-01-14 | Rosemount Inc. | Capacitive pressure sensing with moving dielectric |
US6508129B1 (en) | 2000-01-06 | 2003-01-21 | Rosemount Inc. | Pressure sensor capsule with improved isolation |
AU2629901A (en) | 2000-01-06 | 2001-07-16 | Rosemount Inc. | Grain growth of electrical interconnection for microelectromechanical systems (mems) |
US6520020B1 (en) | 2000-01-06 | 2003-02-18 | Rosemount Inc. | Method and apparatus for a direct bonded isolated pressure sensor |
JP3932302B2 (ja) * | 2000-12-27 | 2007-06-20 | 独立行政法人産業技術総合研究所 | 圧力センサ |
FR2818676B1 (fr) * | 2000-12-27 | 2003-03-07 | Freyssinet Int Stup | Procede de demontage d'un cable de precontrainte et dispositif pour la mise en oeuvre |
US6848316B2 (en) * | 2002-05-08 | 2005-02-01 | Rosemount Inc. | Pressure sensor assembly |
US6993973B2 (en) * | 2003-05-16 | 2006-02-07 | Mks Instruments, Inc. | Contaminant deposition control baffle for a capacitive pressure transducer |
DE102005003548A1 (de) * | 2004-02-02 | 2006-02-09 | Volkswagen Ag | Bedienelement für ein Kraftfahrzeug |
US7201057B2 (en) * | 2004-09-30 | 2007-04-10 | Mks Instruments, Inc. | High-temperature reduced size manometer |
US7141447B2 (en) * | 2004-10-07 | 2006-11-28 | Mks Instruments, Inc. | Method of forming a seal between a housing and a diaphragm of a capacitance sensor |
US7137301B2 (en) * | 2004-10-07 | 2006-11-21 | Mks Instruments, Inc. | Method and apparatus for forming a reference pressure within a chamber of a capacitance sensor |
US7204150B2 (en) | 2005-01-14 | 2007-04-17 | Mks Instruments, Inc. | Turbo sump for use with capacitive pressure sensor |
US8187195B2 (en) * | 2005-10-12 | 2012-05-29 | Radi Medical Systems Ab | Sensor wire assembly |
JP2009250874A (ja) * | 2008-04-09 | 2009-10-29 | Nagano Keiki Co Ltd | 物理量センサおよびその製造方法 |
WO2013035515A1 (ja) | 2011-09-07 | 2013-03-14 | Tdk株式会社 | 積層型コイル部品 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3880009A (en) * | 1973-05-24 | 1975-04-29 | Bunker Ramo | Pressure transducer |
US4426673A (en) * | 1976-03-12 | 1984-01-17 | Kavlico Corporation | Capacitive pressure transducer and method of making same |
US4064550A (en) * | 1976-03-22 | 1977-12-20 | Hewlett-Packard Company | High fidelity pressure transducer |
US4262399A (en) * | 1978-11-08 | 1981-04-21 | General Electric Co. | Ultrasonic transducer fabricated as an integral park of a monolithic integrated circuit |
US4277814A (en) * | 1979-09-04 | 1981-07-07 | Ford Motor Company | Semiconductor variable capacitance pressure transducer assembly |
US4381788A (en) * | 1981-02-27 | 1983-05-03 | Douglas David W | Method and apparatus for detecting apnea |
US4389895A (en) * | 1981-07-27 | 1983-06-28 | Rosemount Inc. | Capacitance pressure sensor |
US4405970A (en) * | 1981-10-13 | 1983-09-20 | United Technologies Corporation | Silicon-glass-silicon capacitive pressure transducer |
-
1981
- 1981-09-30 JP JP56153611A patent/JPS5855732A/ja active Granted
-
1982
- 1982-09-28 US US06/426,084 patent/US4495820A/en not_active Expired - Lifetime
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62186938A (ja) * | 1986-02-13 | 1987-08-15 | Okazaki Seisakusho:Kk | 固体の接合方法 |
US5041900A (en) * | 1987-08-06 | 1991-08-20 | Hamilton Standard Controls, Inc. | Semiconductor device having sealed electrical feedthrough |
JP2000018908A (ja) * | 1998-07-02 | 2000-01-21 | Nippon Telegr & Teleph Corp <Ntt> | 表面形状認識用センサ |
US6438257B1 (en) | 1998-07-02 | 2002-08-20 | Nippon Telegraph And Telephone Corporation | Small capacitance change detection device |
CN111128551A (zh) * | 2019-12-03 | 2020-05-08 | 上海理工大学 | 一种基于二氧化硅微球的微电发生器及制备方法 |
Also Published As
Publication number | Publication date |
---|---|
JPS6356935B2 (en]) | 1988-11-09 |
US4495820A (en) | 1985-01-29 |
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